{"id":166072,"date":"2026-03-24T23:13:48","date_gmt":"2026-03-24T21:13:51","guid":{"rendered":"https:\/\/prohoster.info\/blog\/novosti-interneta\/za-predelami-euv-lace-lithography-gotovit-litografiyu-na-atomah-geliya-s-razresheniem-01-nm"},"modified":"2026-03-27T13:27:33","modified_gmt":"2026-03-27T11:27:33","slug":"za-predelami-euv-lace-lithography-gotovit-litografiyu-na-atomah-geliya-s-razresheniem-01-nm","status":"publish","type":"post","link":"https:\/\/prohoster.info\/cs\/blog\/news\/za-predelami-euv-lace-lithography-gotovit-litografiyu-na-atomah-geliya-s-razresheniem-01-nm","title":{"rendered":"\u201eMimo EUV\u201c: Lace Lithography p\u0159ipravuje litografii na atomech helia s rozli\u0161en\u00edm 0,1 nm","gt_translate_keys":[{"key":"rendered","format":"text"}]},"content":{"rendered":"

Norsk\u00fd startup Lace Lithography s podporou Microsoft z\u00edskal 40 milion\u016f dolar\u016f v r\u00e1mci prvn\u00edho kola financov\u00e1n\u00ed pro v\u00fdvoj litografick\u00e9ho skeneru, kter\u00fd pou\u017e\u00edv\u00e1 svazek helium atom\u016f p\u0159i zpracov\u00e1n\u00ed k\u0159em\u00edkov\u00fdch desek. Spole\u010dnost tvrd\u00ed, \u017ee jej\u00ed technologie umo\u017en\u00ed v\u00fdrobu prvk\u016f \u010dip\u016f v desetin\u00e1sobn\u011b men\u0161\u00edch rozm\u011brech ne\u017e st\u00e1vaj\u00edc\u00ed litografick\u00e9 syst\u00e9my, s \u0161\u00ed\u0159kou svazku pouh\u00fdch 0,1 nm \u2014 EUV skenery ASML vyu\u017e\u00edvaj\u00ed z\u00e1\u0159en\u00ed s vlnovou d\u00e9lkou 13,5 nm.<\/p>\n

<\/center>\"\u201eMimo<\/p>\n

V\u00fdhodou syst\u00e9mu Lace je, \u017ee atomy nemaj\u00ed difrak\u010dn\u00ed mez, zat\u00edmco fotonov\u00e1 litografie, v\u010detn\u011b EUV syst\u00e9m\u016f od ASML, je omezena vlnovou d\u00e9lkou pou\u017eit\u00e9ho sv\u011btla. Jak se v\u00fdrobci \u010dip\u016f sna\u017e\u00ed zmen\u0161it rozm\u011bry prvk\u016f, spol\u00e9haj\u00ed na st\u00e1le slo\u017eit\u011bj\u0161\u00ed metody v\u00edcestup\u0148ov\u00e9ho formov\u00e1n\u00ed vzor\u016f, aby toto omezen\u00ed p\u0159ekonali, ale Lace pou\u017e\u00edv\u00e1 jin\u00fd p\u0159\u00edstup, nahrazuje fotony neutr\u00e1ln\u00edmi atomy helia a svazkem, jeho\u017e \u0161\u00ed\u0159ka se p\u0159ibli\u017en\u011b rovn\u00e1 \u0161\u00ed\u0159ce jednoho atomu vod\u00edku.<\/p>\n

Lace popisuje sv\u00e9 syst\u00e9my jako BEUV, nebo Beyond-EUV (\"za hranicemi EUV\"). Gener\u00e1ln\u00ed \u0159editelka a spoluzakladatelka Lace Bodil Holst uvedla, \u017ee technologie vyvinut\u00e1 spole\u010dnost\u00ed umo\u017en\u00ed v\u00fdrobc\u016fm \u010dip\u016f tisknout desky s \"nakonec atomov\u00fdm rozli\u0161en\u00edm\". V\u011bdeck\u00fd \u0159editel pro litografii Imec John Petersen v\u011b\u0159\u00ed, \u017ee tento p\u0159\u00edstup m\u016f\u017ee sn\u00ed\u017eit tranzistory a dal\u0161\u00ed prvky o \u0159\u00e1d, t\u00e9m\u011b\u0159 na \"nep\u0159edstavitelnou\" \u00farove\u0148.<\/p>\n

Lace se p\u0159ipojila k rostouc\u00edmu po\u010dtu startup\u016f vyv\u00edjej\u00edc\u00edch alternativy k pokro\u010dil\u00e9 litografii ASML. Americk\u00e9 spole\u010dnosti Substrate a xLight vyv\u00edjej\u00ed zdroje sv\u011btla zalo\u017een\u00e9 na urychlova\u010d\u00edch \u010d\u00e1stic pro EUV nebo rentgenovou litografii, p\u0159i\u010dem\u017e xLight z\u00edskala 150 milion\u016f dolar\u016f st\u00e1tn\u00edho financov\u00e1n\u00ed USA. Canon dodala sv\u016fj prvn\u00ed n\u00e1stroj pro nanoimprintovou litografii na Texask\u00fd institut elektroniky ji\u017e v z\u00e1\u0159\u00ed 2024 a \u010d\u00ednsk\u00e1 spole\u010dnost Prinano ned\u00e1vno p\u0159edstavila vlastn\u00ed syst\u00e9m nanoimprintov\u00e9 litografie na dom\u00e1c\u00edm trhu.<\/p>\n

Nicm\u00e9n\u011b p\u0159\u00edstup Lace se li\u0161\u00ed od v\u0161ech t\u011bchto spole\u010dnost\u00ed. Zat\u00edmco Substrate a xLight st\u00e1le pou\u017e\u00edvaj\u00ed fotony, Lace se zcela vzd\u00e1v\u00e1 elektromagnetick\u00e9ho z\u00e1\u0159en\u00ed. A\u010dkoli Lace ji\u017e vytvo\u0159ila prototypy syst\u00e9mu, propast mezi laborato\u0159\u00ed a v\u00fdrobou je, jako v\u017edy, obrovsk\u00e1. V sou\u010dasn\u00e9 dob\u011b spole\u010dnost pl\u00e1nuje nasadit zku\u0161ebn\u00ed za\u0159\u00edzen\u00ed v pilotn\u00edm podniku do roku 2029, a zat\u00edm nebyly ozn\u00e1meny \u017e\u00e1dn\u00e9 term\u00edny pro p\u0159echod na s\u00e9riovou v\u00fdrobu.<\/p>\n

Je t\u0159eba poznamenat, \u017ee ASML str\u00e1vila desetilet\u00ed a miliardy dolar\u016f t\u00edm, \u017ee p\u0159em\u011bnila EUV litografii z v\u00fdzkumn\u00e9 koncepce na komer\u010dn\u00ed produkt. V Lace nyn\u00ed pracuje v\u00edce ne\u017e 50 lid\u00ed v Norsku, \u0160pan\u011blsku, Spojen\u00e9m kr\u00e1lovstv\u00ed a Nizozemsku a sv\u00e9 prvn\u00ed v\u00fdsledky v\u00fdzkumu spole\u010dnost poprv\u00e9 p\u0159edstavila na konferenci SPIE Advanced Lithography + Patterning 2026.<\/p>\n

Zdroj:<\/strong><\/p>\n