Wahi a ka pūnaewele IEEE Spectrum, mai ka hopena o Pepeluali a hiki i ka hoʻomaka ʻana o Malaki, ua hana ʻia kahi keʻena hana ma ke kikowaena Belgian Imec me ka hui ʻAmelika KMLabs e aʻo i nā pilikia me ka photolithography semiconductor ma lalo o ka mana o EUV radiation (i ka ultra- ka laulā ultraviolet paʻakikī). Me he mea lā, he aha ka mea e aʻo ai ma ʻaneʻi? ʻAʻole, aia kahi kumuhana e aʻo ai, akā no ke aha e hoʻokumu ai i kahi keʻena hou no kēia? Ua hoʻomaka ʻo Samsung i ka hana ʻana i nā chips 7nm me ka hoʻohana hapa ʻana o nā scanners EUV i ʻeono mahina i hala. E hui koke ʻo TSMC i kēia hana. I ka hopena o ka makahiki, e hoʻomaka ana lāua ʻelua i ka hana ʻino me nā kūlana o 5 nm a pēlā aku. Eia nō naʻe he mau pilikia, a he koʻikoʻi lākou e ʻimi ʻia ai nā pane i nā nīnau ma nā hale hana, ʻaʻole i ka hana.
ʻO ka pilikia nui i ka lithography EUV i kēia lā ke mau nei ka maikaʻi o ka photoresist. ʻO ke kumu o ka radiation EUV he plasma, ʻaʻole laser, e like me ke ʻano me nā scanners 193 nm kahiko. Hoʻokuʻu ka laser i kahi kulu o ke kēpau i loko o kahi kinoea a me ka hopena o ka radiation emits photons, ʻo ka ikaika o ia mea he 14 mau manawa kiʻekiʻe ma mua o ka ikehu o nā kiʻi i loko o nā scanners me ka radiation ultraviolet. ʻO ka hopena, ʻaʻole i luku wale ʻia ka photoresist ma kēlā mau wahi i hoʻopaʻa ʻia e nā kiʻi kiʻi, akā hiki nō hoʻi nā hewa maʻamau, ʻo ia hoʻi ma muli o ka hopena noise fractional. Kiʻekiʻe loa ka ikehu o nā photon. Hōʻike nā hoʻokolohua me nā scanners EUV i nā photoresists, hiki ke hana pū me nā kūlana 7 nm, i ke ʻano o ka hana ʻana i nā kaapuni 5 nm e hōʻike ana i kahi kiʻekiʻe kiʻekiʻe o nā hemahema. He koʻikoʻi loa ka pilikia i manaʻoʻiʻo ʻole ka poʻe loea i ka hoʻomaka wikiwiki ʻana o ka ʻenehana kaʻina 5 nm, ʻaʻole e haʻi i ka hoʻololi ʻana i 3 nm a ma lalo.
ʻO ka pilikia o ka hana ʻana i kahi hanauna hou o photoresist e hoʻāʻo ʻia e hoʻoponopono ʻia i loko o ka hale hana hui o Imec a me KMLabs. A e hoʻoponopono lākou mai ka manaʻo o ka ʻepekema ʻepekema, ʻaʻole ma ke koho ʻana i nā reagents, e like me ka hana ʻana i nā makahiki he kanakolukūmālua i hala. No ka hana ʻana i kēia, e hana nā hoa ʻepekema i kahi mea hana no ka noiʻi kikoʻī o nā kaʻina hana kino a me nā kemika i ka photoresist. ʻO ka maʻamau, hoʻohana ʻia nā synchrotrons e aʻo i nā kaʻina hana ma ka pae mole, akā ke hoʻolālā nei ʻo Imec a me KMLabs e hana i ka EUV projection a me nā lako ana e pili ana i nā laser infrared. He loea ʻo KMLabs i nā ʻōnaehana laser.
Ma muli o ka hoʻokomo ʻana i ka laser KMLabs, e hana ʻia kahi kahua no ka hana ʻana i nā harmonics kiʻekiʻe. ʻO ka mea maʻamau, no kēia kumu, kuhikuhi ʻia kahi pulse laser kiʻekiʻe i loko o kahi mea kinoea kahi e ala mai ai nā harmonics kiʻekiʻe loa o ka pulse kuhikuhi. Me kēia hoʻololi ʻana, loaʻa ka mana nui, no laila ʻaʻole hiki ke hoʻohana pololei ʻia kahi loina like o ka hana ʻana i ka radiation EUV no ka lithography semiconductor. Akā ua lawa kēia no nā hoʻokolohua. ʻO ka mea nui, hiki ke hoʻomalu ʻia ka radiation hopena e ka lōʻihi o ka pulse mai nā picoseconds (10-12) a i attoseconds (10-18), a me ka lōʻihi hawewe mai 6,5 nm a 47 nm. He mau ano waiwai keia no ka mea ana. E kōkua lākou i ke aʻo ʻana i nā kaʻina hana o ka ultra-fast molecular hoʻololi i ka photoresist, nā kaʻina hana ionization a me ka ʻike ʻana i nā photons kiʻekiʻe. Me ka ʻole o kēia, ʻo ka photolithography ʻoihana me nā kūlana haʻahaʻa ma mua o 3 a hiki i ka 5 nm ke nīnau ʻia.
Source: 3dnews.ru