Raws li IEEE Spectrum lub vev xaib, txij thaum kawg ntawm Lub Ob Hlis mus txog rau thaum pib lub Peb Hlis, lub chaw soj nstuam tau tsim nyob rau hauv Belgian Imec center ua ke nrog Asmeskas tuam txhab KMLabs los kawm txog teeb meem nrog semiconductor photolithography nyob rau hauv lub zog ntawm EUV hluav taws xob (hauv ultra- hard ultraviolet ntau yam). Nws yuav zoo li, muaj dab tsi los kawm ntawm no? Tsis yog, muaj ib qho kev kawm, tab sis vim li cas thiaj tsim lub chaw kuaj mob tshiab rau qhov no? Samsung pib tsim 7nm chips nrog ib feem siv EUV scanners rau lub hlis dhau los. TSMC yuav sai sai no koom nrog hauv qhov kev siv zog no. Thaum kawg ntawm lub xyoo, ob leeg yuav pib pheej hmoo ntau lawm nrog cov qauv ntawm 5 nm thiab lwm yam. Thiab tseem muaj teeb meem, thiab lawv loj txaus uas cov lus teb rau cov lus nug yuav tsum tau nrhiav nyob rau hauv lub chaw soj nstuam, thiab tsis nyob rau hauv ntau lawm.
Qhov teeb meem tseem ceeb hauv EUV lithography hnub no tseem yog qhov zoo ntawm photoresist. Lub hauv paus ntawm EUV hluav taws xob yog plasma, tsis yog laser, ib yam li cov laus 193 nm scanners. Lub laser evaporates ib tug poob ntawm txhuas nyob rau hauv ib tug gaseous ib puag ncig thiab qhov tshwm sim hluav taws xob emits photons, lub zog ntawm uas yog 14 lub sij hawm siab tshaj lub zog ntawm photons nyob rau hauv scanners nrog ultraviolet hluav taws xob. Yog li ntawd, lub photoresist tsis yog tsuas yog puas nyob rau hauv cov chaw uas nws yog bombarded los ntawm photons, tab sis kuj random yuam kev tshwm sim, nrog rau vim lub thiaj li hu ua fractional suab nrov. Lub zog ntawm photons siab dhau lawm. Kev sim nrog EUV scanners qhia tau tias photoresists, uas tseem muaj peev xwm ua haujlwm nrog 7 nm cov qauv, nyob rau hauv cov ntaub ntawv ntawm kev tsim 5 nm circuits qhia tau hais tias muaj kev cuam tshuam loj heev. Qhov teeb meem yog qhov hnyav heev uas ntau tus kws tshaj lij tsis ntseeg tias qhov kev ua tiav sai ntawm 5 nm txheej txheem thev naus laus zis, tsis hais txog kev hloov pauv mus rau 3 nm thiab hauv qab no.
Qhov teeb meem ntawm kev tsim ib tiam tshiab ntawm photoresist yuav raug sim los daws nyob rau hauv kev sib koom tes ntawm Imec thiab KMLabs. Thiab lawv yuav daws tau nws los ntawm qhov pom ntawm kev tshawb fawb mus kom ze, thiab tsis yog los ntawm kev xaiv cov tshuaj reagents, raws li tau ua nyob rau hauv peb caug xyoo dhau los. Ua li no, cov neeg koom nrog kev tshawb fawb yuav tsim ib lub cuab yeej rau kev kawm ntxaws txog cov txheej txheem ntawm lub cev thiab tshuaj hauv photoresist. Feem ntau, synchrotrons yog siv los kawm cov txheej txheem ntawm qib molecular, tab sis Imec thiab KMLabs tab tom npaj tsim EUV qhov projection thiab ntsuas cov cuab yeej raws li infrared lasers. KMLabs yog tus kws tshaj lij hauv cov tshuab laser.
Raws li KMLabs laser installation, ib lub platform rau tsim kom muaj kev sib haum xeeb siab yuav raug tsim. Feem ntau, rau lub hom phiaj no, lub siab siv laser mem tes yog coj mus rau hauv qhov nruab nrab gaseous, uas muaj ntau zaus harmonics ntawm cov mem tes qhia tshwm sim. Nrog xws li kev hloov dua siab tshiab, qhov poob ntawm lub zog tseem ceeb tshwm sim, yog li lub hauv paus ntsiab lus zoo sib xws ntawm kev tsim hluav taws xob EUV tsis tuaj yeem siv ncaj qha rau semiconductor lithography. Tab sis qhov no yog txaus rau kev sim. Qhov tseem ceeb tshaj plaws, qhov tshwm sim hluav taws xob tuaj yeem tswj tau ob qho tib si los ntawm lub sijhawm pulse xws li picoseconds (10-12) mus rau attoseconds (10-18), thiab los ntawm wavelength ntawm 6,5 nm mus rau 47 nm. Cov no yog cov khoom muaj txiaj ntsig zoo rau lub ntsuas ntsuas. Lawv yuav pab kawm txog cov txheej txheem ntawm ultra-ceev molecular hloov hauv photoresist, ionization txheej txheem thiab raug rau high-zog photons. Yog tsis muaj qhov no, kev lag luam photolithography nrog cov qauv tsawg dua 3 thiab txawm tias 5 nm tseem nyob rau hauv nqe lus nug.
Tau qhov twg los: 3d xov.ru