„EUV-n kívül”: A Lace Lithography héliumatomokkal készített litográfiát készít 0,1 nm felbontással
A norveg startup, Lace Lithography, with the support of Microsoft, has raised $40 million in its first funding round to develop a lithographic scanner that uses a helium atom beam for processing silicon wafers. The company claims that its technology will enable the creation of chip elements that are 10 times smaller than existing lithography systems, with a beam width of only 0.1 nm — EUV scanners from ASML use […]
