Shirkadda cusub ee Noorwiijiga ah ee Lace Lithography, oo ay taageerto Microsoft, ayaa ururisay $40 milyan wareeggeedii ugu horreeyay ee maalgelin ah si ay u horumariso iskaanka lithography kaas oo isticmaala fallaadho atomyo helium ah si loo farsameeyo wafers silicon ah. Shirkaddu waxay sheegtay in tignoolajiyadeedu ay awood u siin doonto abuurista muuqaallada jajabka 10 jeer ka yar nidaamyada lithography ee jira, iyadoo ballaca fallaadhaha uu yahay 0,1 nm oo keliya—iskaannada EUV ee ASML waxay isticmaalaan hirar dhererkoodu yahay 13,5 nm.
Faa'iidada nidaamka Lace-ka ayaa ah in atamadu aysan lahayn kala-soocid, halka lithography-ga photonic-ga, oo ay ku jiraan nidaamyada EUV ee ASML, ay xaddidan tahay mowjadda iftiinka la isticmaalay. Maadaama sameeyayaasha chip-ka ay yareeyaan cabbirrada astaamaha, waxay ku tiirsan yihiin farsamooyinka qaabaynta lakabka badan ee sii kordhaya si ay uga gudbaan xaddidaaddan. Si kastaba ha ahaatee, lace-ku wuxuu qaataa hab kale, isagoo photons-ka ku beddelaya atamka helium-ka dhexdhexaadka ah iyo alwaax ballaciisu yahay qiyaastii la mid ah ballaca hal atamka hydrogen.
Lace waxay nidaamyadeeda ku tilmaamaysaa BEUV, ama Beyond-EUV. Madaxa shirkadda Lace iyo aasaasaha shirkadda Bodil Holst ayaa sheegay in tignoolajiyada shirkaddu ay u oggolaan doonto sameeyayaasha chip-ka inay daabacaan wafers leh "ugu dambeyntii xallinta atomiga." John Petersen, agaasimaha sayniska ee lithography-ga Imec, ayaa aaminsan in habkani uu yarayn karo transistor-yada iyo qaybaha kale si kala duwan, ilaa heer "aan la qiyaasi karin".
Lace waxay ku biirtay tiro sii kordheysa oo shirkado cusub ah oo horumarinaya beddelka lithography-ga horumarsan ee ASML. Shirkadaha Mareykanka ee Substrate iyo xLight waxay horumarinayaan ilo iftiin oo ku salaysan dardar-gelinta walxaha si loogu sameeyo lithography-ga EUV ama X-ray, iyadoo xLight ay heshay $150 milyan oo maalgelin ah oo ay siisay dowladda Mareykanka. Canon waxay qalabkeedii ugu horreeyay ee lithography-ga nanoimprint u geysay Machadka Elektaroonikada ee Texas bishii Sebtembar 2024, shirkadda Shiinaha ee Prinano ayaa dhawaan soo bandhigtay nidaamkeeda lithography-ga nanoimprint ee u gaarka ah suuqa gudaha.
Si kastaba ha ahaatee, habka Lace wuu ka duwan yahay dhammaan shirkadahan. In kasta oo Substrate iyo xLight ay wali isticmaalaan photons, Lace waxay si buuxda u baabi'isaa shucaaca elektromagnetic-ka. In kasta oo Lace ay horey u abuurtay noocyo tijaabo ah oo nidaamka ah, farqiga u dhexeeya shaybaadhka iyo wax soo saarka ayaa weli ah mid aad u weyn. Shirkaddu hadda waxay qorsheyneysaa inay qalab tijaabo ah ku geyso xarun tijaabo ah marka la gaaro 2029, iyada oo aan weli la gaarin waqti loogu talagalay wax soo saarka ballaaran.
Waxaa xusid mudan in ASML ay ku bixisay tobanaan iyo balaayiin doolar horumarinta cilmiga EUV laga bilaabo fikradda cilmi-baarista una gudubto badeecad ganacsi. Lace hadda waxay shaqaaleysiisaa in ka badan 50 qof oo ku nool Norway, Spain, UK, iyo Netherlands, shirkadduna waxay natiijooyinkeedii cilmi-baarista ee ugu horreeyay ku soo bandhigtay shirkii SPIE Advanced Lithography + Patterning 2026.
Source:
Source: 3dnews.ru
