I-Samsung ithatha ngokupheleleyo inzuzo yayo yobuvulindlela kwi-semiconductor lithography isebenzisa iiskena ze-EUV. Njengoko i-TSMC ilungiselela ukuqalisa ukusebenzisa iiskena ze-13,5 nm ngoJuni, zilungelelanise ukuba zivelise iitshiphusi kwisizukulwana sesibini senkqubo ye-7 nm, i-Samsung intywila nzulu kwaye.
Ukunceda inkampani ukuba ihambe ngokukhawuleza ekuboneleleni ngetekhnoloji yenkqubo ye-7nm kunye ne-EUV ukuvelisa izisombululo ze-5nm kunye ne-EUV yayiyinyani yokuba i-Samsung igcine ukusebenzisana phakathi kwezinto zoyilo (IP), izixhobo zoyilo, kunye nezixhobo zokuhlola. Phakathi kwezinye izinto, oku kuthetha ukuba abathengi benkampani baya kugcina imali ekuthengeni izixhobo zokuyila, ukuvavanya kunye neebhloko ze-IP esele zenziwe. I-PDKs yoyilo, indlela yokusebenza (i-DM, iindlela zokuyila) kunye neqonga loyilo oluzenzekelayo lwe-EDA luye lwafumaneka njengenxalenye yophuhliso lweetshiphusi zemigangatho ye-Samsung ye-7-nm kunye ne-EUV kwikota yesine kulo nyaka uphelileyo. Zonke ezi zixhobo ziya kuqinisekisa uphuhliso lweeprojekthi zedijithali nakwiteknoloji yenkqubo ye-5 nm ene-FinFET transistors.
Xa kuthelekiswa nenkqubo ye-7nm usebenzisa i-EUV scanners, leyo yinkampani
Isamsung ivelisa iimveliso isebenzisa iskena se-EUV kwiplanti ye-S3 eHwaseong. Kwisiqingatha sesibini salo nyaka, inkampani iya kugqiba ukwakhiwa kwendawo entsha ecaleni kweFab S3, eya kuba ilungele ukuvelisa iitshiphusi kusetyenziswa iinkqubo ze-EUV kunyaka ozayo.
umthombo: 3dnews.ru